1969 年将第一人送上月球所使用的计算能力还不如今天我们每个人的智能手机。芯片的微型化和半导体计算能力的不断发展,使这一令人难以置信的进步成为可能。
无线连接、复杂的汽车功能或物联网的兴起,都反映了对能够满足高要求的半导体需求的增长。超纯特种化学品是光刻工艺中使用的基本原材料,光刻工艺是生产内存和逻辑芯片的关键步骤。
贺利氏电子化学材料生产电子级光活性材料已有 30 多年的历史,为高分辨率的光刻胶提供了独特的产品。
这些产品大多纯度超过 99.5%,所有 26 种金属的含量均低于 10ppb。这使得传统化学品也能用于光刻胶的前沿领域。
35 个搜索结果
Name | Technology | Product Type | Description | |
---|---|---|---|---|
DTBPIO-C1 | Deep UV | PAG | Strong acid(C1) generation m.p. 104–105°C | |
DTBPIO-CS | Deep UV | PAG, PFAS-Free PAG | Weak acid (camphorsulfonic acid) generation m.p. 215–217°C | |
DTBPIO-Nf | Deep UV | PAG | Low diffusion strong acid(nonaflic acid) generation m.p. 175–177°C | |
DTBPIO-TFMBS | Deep UV | PAG | Weak acid (o-trifluoromethylbenzenesulfonic acid) generation m.p. 162–164°C | |
HTPG-104S | i-line | PAG, PFAS-Free PAG | White powder Strong acid (HCI) generation m.p. 143–145°C | |
ILP-110 | i-line | PAG | Light-yellow powder Strong acid(triflic acid) generation m.p. 113–114°C | |
ILP-110N | i-line | PAG | Low diffusion strong acid (nonaflic acid) generation m.p. 122–124°C | |
ILP-113 | I, h-line broadband | PAG | Yellow powder Strong acid (triflic acid) generation m.p. 125–126°C | |
ILP-118 | i-line | PAG | Light-yellow powder Strong acid(triflic acid) generation m.p. 66–68°C | |
MDT | Deep UV | PAG | White powder Strong acid (triflic acid) generation m.p. 88–89°C | |
NIN | i-line | PAG | White crystalline powder. Low diffusion Strong acid(nonaflic acid) generation m.p. 148.5–149.5°C | |
NIT | i-line | PAG | White powder Strong acid(triflic acid) generation m.p. 210–214°C | |
PA-229 | Deep UV | PAG | White powder Low diffusion strong acid (nonaflic acid) generation m.p. 54–56°C | |
PA-253 | ArF | PAG | Strong acid generation m.p. 128–129°C | |
PA-255 | ArF | PAG | Strong acid generation m.p. 93-95°C | |
PA-279 | ArF | PAG | Strong acid generation m.p. 143-145°C | |
PA-296 | Deep UV | PAG | Strong acid(N3) generation m.p. 159-161°C | |
PA-298 | i-line | PAG, PFAS-Free PAG | Yellow powder Weak acid(tosylic acid) generation m.p. 130–131°C | |
PA-304 | Deep UV | PAG | Strong acid(C1) generation m.p. 130–131°C | |
PA-313 | ArF | PAG | Strong acid generation m.p. 129–130°C |