随着对光刻胶厚度的要求越来越高,越来越多的配方都含有热酸,以便在后烘烤过程中进行最终固化。
贺利氏可提供一套不含 IP 的产品,具有不同的酸释放温度。在应用中,半导体级纯度和有效成本是不可缺少的。
3 个搜索结果
Name | Technology | Product Type | Description | |
---|---|---|---|---|
TA-101 | Multi-layer photo-lithographic application | Thermal Acid Generators | White powder 4.5% (w/w) in PGMEA m.p. 101–102°C | |
TA-102 | Multi-layer photo-lithographic application | Thermal Acid Generators | White powder 2.5% (w/w) in PGMEA m.p. 126–127°C | |
TA-103 | Multi-layer photo-lithographic application | Thermal Acid Generators | White powder 5% (w/w) in PGMEA m.p. 101–102°C |