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52 个搜索结果

Name
Technology
Product Type
Description
9-AMM Multi-layer photo-lithographic applicationMonomersYellow powder m.p. 86–88°C
DTBPIO-C1Deep UVPAGStrong acid(C1) generation m.p. 104–105°C
DTBPIO-CSDeep UVPAG, PFAS-Free PAGWeak acid (camphorsulfonic acid) generation m.p. 215–217°C
DTBPIO-NfDeep UVPAGLow diffusion strong acid(nonaflic acid) generation m.p. 175–177°C
DTBPIO-TFMBSDeep UVPAGWeak acid (o-trifluoromethylbenzenesulfonic acid) generation m.p. 162–164°C
ECHAMulti-layer photo-lithographic applicationMonomersColourless liquid
HAdMAMulti-layer photo-lithographic applicationMonomersWhite powder m.p. 89–91°C
HTPG-104Si-linePAG, PFAS-Free PAGWhite powder Strong acid (HCI) generation m.p. 143–145°C
HTPI-405i-linePFAS-Free PAG, Photo-initiatorsWeak acid generation m.p. 86-88°C
HTPI-4057i-linePFAS-Free PAG, Photo-initiatorsWeak acid generation m.p. 56-58°C
HTPI-429i-linePFAS-Free PAG, Photo-initiatorsWeak acid generation m.p. 71-74°C
ILP-110i-linePAGLight-yellow powder Strong acid(triflic acid) generation m.p. 113–114°C
ILP-110Ni-linePAGLow diffusion strong acid (nonaflic acid) generation m.p. 122–124°C
ILP-113I, h-line broadbandPAGYellow powder Strong acid (triflic acid) generation m.p. 125–126°C
ILP-118i-linePAGLight-yellow powder Strong acid(triflic acid) generation m.p. 66–68°C
MAdMAMulti-layer photo-lithographic applicationMonomersColourless liquid
MDTDeep UVPAGWhite powder Strong acid (triflic acid) generation m.p. 88–89°C
MNLMAMulti-layer photo-lithographic applicationMonomersWhite powder m.p. 74~77°C
NINi-linePAGWhite crystalline powder. Low diffusion Strong acid(nonaflic acid) generation m.p. 148.5–149.5°C
NITi-linePAGWhite powder Strong acid(triflic acid) generation m.p. 210–214°C